The CVC SC-400 Deposition System is a low-volume unit that permits using a variety of techniques and configurations. The system consists of a relay-rack control center and an equipment cabinet which houses the vacuum chamber and the vacuum pumping system. The system is primarily used for sputtering with 2 magnetron sputtering S-Guns. However, e-beam and thermal evaporation are also possible with the system’s 2 E-beam guns, 2 thermal crucibles, and ion source.
Mountable sample sizes include small chips as well 2-inch (6 samples), 3-inch (3 samples), and 4-inch (one sample) wafers.
Please note that NCF does not provide sputtering targets for user deposition and targets currently available have been left behind by previous users of the system. Available sputtering targets include: Cr, Al, Al/Si (98%/2%), Mo, W, Ti, Nb, Si, C, Si3N4, SiO2, Al2O3, TiO2, and Va2O5.
Location: Cleanroom, Dry Bay
Training: 3 sessions (2 Trainings and 1 Checkout)
One time Reservation Cost: $20
Per Hour Cost: Free
Cleanroom Usage: $34/hr for internal and non-profit, $50/hr for external users
The user manual can be found here.