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Potassium Hydroxide (KOH) etching is a wet chemical etching process used to create cavities in silicon. Highly corrosive alkaline chemical compound (pH > 12) is used in conjunction with DI water and thermal regulation. The etch rate is depending on the concentration of the KOH solution and temperature. KOH is a strong, corrosive base and should be handled with extreme care.

Location: Cleanroom, Wet Bay II

Training: 1 training and a checkout session

Technical Information

  • Product info :
  • System Features:
    • Teflon (PFA) diffuser plate
    • Teflon (refluxor) condensing system
    • Teflon immersion heater (120VAC)
    • Vessel inside dimensions to be 8.0" x 8.0" x 8.0" liquid level
    • Tank sized for 1-6” carrier
    • Teflon pneumatic pump
    • Teflon filter housing