Potassium Hydroxide (KOH) etching is a wet chemical etching process used to create cavities in silicon. Highly corrosive alkaline chemical compound (pH > 12) is used in conjunction with DI water and thermal regulation. The etch rate is depending on the concentration of the KOH solution and temperature. KOH is a strong, corrosive base and should be handled with extreme care.
Location: Cleanroom, Wet Bay II
Training: 1 training and a checkout session
Technical Information
- Product info : https://www.modutek.com/
- System Features:
- Teflon (PFA) diffuser plate
- Teflon (refluxor) condensing system
- Teflon immersion heater (120VAC)
- Vessel inside dimensions to be 8.0" x 8.0" x 8.0" liquid level
- Tank sized for 1-6” carrier
- Teflon pneumatic pump
- Teflon filter housing