NCF’s TRION Mini-lock-Phantom III ICP-RIE system comes with a vacuum load-lock that allows for isolation of the reaction chamber from atmosphere to reduce the impact of exposure to atmosphere between runs. With a 600 watt, 13.56 MHz solid state RF generator, users have the option of standard processing or inductively coupled plasma enhanced etching. The system can accommodate multiple wafers in a single run. After passing the NCF safety exam, users can request training on this machine by sending an email to firstname.lastname@example.org. Those not trained can request an NCF work service order by contacting the lab manager.
Location: Clean room-deposition bay
Training: 3-5 sessions (Minimum training - 2 trainings and a checkout session)
- Wafer Sizes: 2, 3, and 4-inch
- Max ICP Power: 600 Watt with automatic matching network
- Min Pressure: 0 MTorr
- GaSes: N2, O2, Ar, SF6, NF3, HE - O2 mixture, CHF3, CCl2F2, Cl2, CF4, SiCl4
One time reservation cost: $20/reservation
Per hour usage cost: Internal user: $10/hr ; External (Academic) user: $15/hr ; External (Industrial or Foreign) : $15/hr
Cleanroom Usage: $34/hr for internal and non-profit, $50/hr for external users
The user Manual can be found here.