NCF’s TRION Mini-lock-Phantom III ICP-RIE system comes with a vacuum load-lock that allows for isolation of the reaction chamber from atmosphere to reduce the impact of exposure to atmosphere between runs. With a 600 watt, 13.56 MHz solid state RF generator, users have the option of standard processing or inductively coupled plasma enhanced etching. The system can accommodate multiple wafers in a single run. After passing the NCF safety exam, users can request training on this machine by sending an email to ncftech@uic.edu. Those not trained can request an NCF work service order by contacting the lab manager.
Location: Clean room-deposition bay
Training: 3-5 sessions (Minimum training - 2 trainings and a checkout session)
Technical Specifications:
- Wafer Sizes: 2, 3, and 4-inch
- Max ICP Power: 600 Watt with automatic matching network
- Min Pressure: 0 MTorr
- GaSes: N2, O2, Ar, SF6, NF3, HE - O2 mixture, CHF3, CCl2F2, Cl2, CF4, SiCl4
Pricing:
One time reservation cost: $20/reservation
Per hour usage cost:
Pricing:
One time Reservation Cost: $5
Per Hour Cost:
$10 Internal User
$16 External User
Cleanroom Usage: $34/hr for internal and non-profit, $54.4/hr for external users
User Manual:
The user Manual can be found here.