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Nanoscribe 3D Lithography System

Come join us as our staff perform a live demo of our Nanoscribe 3D Lithography System which can achieve 3D structures using conventional direct laser writing (DLW) or Nanoscribe’s dipin laser lithography (DiLL), utilizing either piezo-mode for high resolution arbitrary 3D trajectories, or galvo-mode for fast printing. This piece of equipment can print features as small as 200 nm in size up to structures several millimeters in size.

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ECE Department, MIE Department, IEEE, etc.