Your browser is unsupported

We recommend using the latest version of IE11, Edge, Chrome, Firefox or Safari.

The PTL LPCVD system features 3 zone tubes that can be used for low and elevated temperature wafer processing. The system currently has 2 operations tubes. Tube 2 is used for undoped Polysilicon and low temperature oxides. Tube 3 is used for Silicon Nitride deposition only. After passing the NCF safety exam, users can request training on this machine by sending an email to Those not trained can request an NCF work service order by contacting the lab manager.

Location: wafer loading/unloading in the cleanroom (deposition bay), system operation in NCF service corridor

Training: 3 sessions (2 trainings and a checkout session)

Technical Specifications:

  • # of Temp Zones: 3 temperature zones per tube
  • Temp Range: 400oC to 1300oC
  • Wafer sizes: 2", 3", and 4"
  • Gases: N2, O2, SiH4, SiH2Cl2, N2O, NH3, NF3, H2, Ar
  • Available Recipes: low stress nitride, low temperature oxide, doped/undoped Polysilicon
  • Boats: 2, 3, and 4-inch quartz boats available


One time reservation cost: $5 / reservation

Per hour usage cost:

$30 Internal User
$48 External User

User Manual:

The user manual can be found here.