Photoresists at NCF
PRs
AZ 1518
Spin Speed – 4000 rpm for 40 seconds
Baking – 90 C for 1 min
Exposure Time – 4.5 sec
Development – 30 seconds in 1:3 (AZ 340 Developer : DI water) developer solution
The spin chart can be found here.
AZ 5214 E (Image Reversal)
Spin Speed – 4000 rpm for 40 seconds
Baking – 110 C for 1 min
Pattern Exposure – 1.5 sec
Reverse Baking – 110 C for 1 min
Flood Exposure – 50 sec
Development – 30 sec in 1:1 (AZ Developer : DI water) developer solution
More information is found here.
AZ 4330 - Positive Thick
Spin Speed – 4000 rpm for 40 seconds – ~3.4 um thickness
Baking – 110 C for 1 min
Pattern Exposure – 30 sec
Development – 45 sec in AZ Developer
More information is found here.
OIR-906 Positive Thin
Dehydration bake wafer at 120C for 5 minutes (or apply HMDS).
Spin on OIR-906 at 4KRPM for 40 seconds.
Prebake at 90C for 1 minute.
Expose for 4.5 to 5 seconds.
Postbake at 120C for 1 minute.
Develop in OPD4262 for 1 minute 30 seconds.