Extended Access Policy

Users who have current clean room access and have qualified for extended access (special safety training required) can have access to the two dry bays in the clean room outside of normal hours (M-F 8am-5:30pm). The special training required to qualify for extended access privileges will have to be repeated annually and will be offered through both the NCF and UICĀ  EHSO training programs.

Extended access to the three wet bays (photo, wet etch I, and wet etch II) will require clearing the activity in advance with the NCF director, Dr. Seyoung An. A second person who also has extended NCF ID access will have to be present, and within viewing or hearing range in the clean room, when anyone is in any of the three wet chemical bays. This means that if someone needs to use the photolithography bay a second user who also has extended access privileges must also be in the photolithography bay as well. All NCF users must immediately notify the NCF manager of any equipment damage the next day. If equipment damage is discovered and responsibility has not been determined, then those users recorded to have entered on the night in question will risk loss of their extended hours privileges.